Skin Care, Sun Care

Pleasing Protection Sunscreen

Siltech's latest formula includes Silwax J1032.

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Released By Siltech Corporation

Pleasing Protection Sunscreen
Ingredients
%

Phase A

  • D.I. Water
  • 50.65
  • Comedia SP (BASF) (Sodium polyacrylate)
  • 1.20
  • Glycerin
  • 5.00
  • SilPlex J2-S (Siltech) (Quaternium-20)
  • 6.00

Phase B

  • Neo Heliopan OS (Symrise) (Ethylhexyl salicylate)
  • 3.00
  • Neo Heliopan 303 (Symrise) (Octocrylene)
  • 4.00
  • Tinosorb S (BASF) (Bis-Ethylhexyloxyphenol methoxyphenyl triazine)
  • 3.50
  • Siltech CE-2000 (Siltech) (Trictyldodecyl citrate)
  • 7.00
  • Silmer Q25 (Siltech) (Trimethylsiloxysilicate)
  • 1.00
  • Silwax J1032 (Siltech) (Alykyl dimethicone)
  • 2.25
  • Neo Heliopan 357 (Symrise) (Butyl methoxygibenzoylmethane)
  • 3.00
  • Neo Heliopan BB (Symrise) (Benzophenone-3)
  • 5.00
  • Neo Heliopan AV (Symrise) (Ethylhexyl methoxycinnamate)
  • 7.50

Phase C

  • Symocide (Symrise) (Phenoxyethanol, decylene glycol, 1,2-hexanediol)
  • 0.90

Procedure

Disperse Cosmedia SP into water and glycerin until it is fully hydrated. Add the rest of the Phase A ingredients and heat to 75-80°C. Combine all the liquids in Phase B and mix well at 500rpm while heating to 80-85°C. Add Phase B into Phase A at 80°C at 1,000 rpm mixing rate and increase the mixing rate during subsequent additions. Maintain mixing rate for 2 minutes when targeting a batch size of 200g. Cool down to room temperature Then, add Phase C while mixing.

More Information

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